Chemical etching and electrolytic etching have been widely used as basic technologies in various fields such as the electronics industry, precision machinery industry, and printing industry. With the advancement of other excellent processing technologies, although the role of this technology in some fields has ended, it is still an important processing technology. The following are some application cases.
(1) Forming circuits by etching thin films
The circuits of computers and communication equipment are composed of printed circuit boards, on which integrated circuits (ICs) with microstructures, as well as resistors and capacitors are installed. As the density of integrated circuits increases, the demand for miniaturization of these resistors and capacitors is also increasing year by year. Taking resistors as an example, in order to achieve miniaturization, traditional wire-wound resistors made by winding thin metal wires on insulators have their limitations. Therefore, products have emerged in which a thin film of a resistive metal or its alloy is formed on an insulator, and a circuit pattern is etched on the film to provide the required resistance value.
As resistors, nickel-chromium alloys and tantalum films are usually used. The etching solution for forming the circuit is a mixed acid composed of nitric acid, hydrochloric acid, and water.
Usually, these films are formed by processes such as sputtering, but in order to further reduce costs, processes such as chemical nickel plating are now being used.
Chemical nickel plating includes Ni-B alloy and Ni-P alloy. Boron-containing nickel alloys can be obtained from a plating solution using sodium borohydride as a nickel reducing agent, while phosphorus-containing nickel alloys can be obtained from a plating solution using sodium hypophosphite. These nickel films form alloys such as Ni2P, Ni3P, Ni2B, and Ni3B, so etching them requires a more reactive etchant. This is because phosphorus P and boron B, which are difficult to etch, will leave stains. Usually, the etching solution composed of sulfuric acid, nitric acid, and water (1:1:1) is heated to 40-50°C before use. Therefore, the resist that protects the non-etched area must also be resistant to this.
(2) Photolithography and printing industry
Printing is a technology that transfers text, graphics, photos, etc. as ink images to the surface of paper, metal, plastic, etc., and a printing plate is required for this purpose.
In the past, printing plates used woodblocks, lead movable type, stone plates, copper plates, etc., but now we have entered the era of phototypesetting. As far as text printing is concerned, movable type is still in use, but all bills using graphics and photos must use photolithography to make printing plates. In this method, an acid-resistant image is made on a metal plate by photographic printing, and then an etchant is used to carve the graphics, photos, etc. into concave or convex surfaces to make a printing plate. As metal materials and etching products for relief printing, zinc, magnesium, and copper are used. Special metals are added to these metals to make the grains smaller, thereby improving printing accuracy. Etching solutions used for etching include nitric acid aqueous solution, nitric acid + hydrochloric acid aqueous solution, and ferric chloride solution for copper.
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